Microwave plasma system ARDIS 100 is designed for chemical vapor deposition of poly-, mono- and nanocrystalline diamond films. Carbon nanotubes and nanowires can also be produced.
Chemical Vapor Deposition method allows synthesizing high purity diamond films with earlier unachievable dimensions possessing unique optical, mechanical, electronic and thermal properties.
|MW power||600-6000 kWt, fr. 2.45 Ghz|
|Number of feed gas channels||4 the system allows adjusting gas flow from 0.3 to 60 l/hr|
|Gas process pressure||30-150 Torr|
|Gas mixtures||primary Н2/СН4, Н2/СН4/О2, Ar/H2/CH4 doping N2, B|
|Sample diameter (typical)||75 mm|
|Substrate temperature||up to 1200 °C|
|Growth rate||up to 6 µmicron/hour|
|Visual control||5 quartz windows|
|Chamber||water-cooled vacuum stainless steel chamber|
|Operation||Windows compatible CCDSys control software allows operation during up to 1000 hours without any interactions from the operator.|